Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films

Influence of oxygen partial pressure on microstructure, optical properties, residual stress and laser induced damage threshold of amorphous HfO2 thin films

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Alloys and Compounds - Volume 771, 15 January 2019, Pages 373-381

S. Jena, R.B. Tokas, S. Tripathi, K.D. Rao, D.V. Udupa, S. Thakur, N.K. Sahoo,