Photo-catalytic TiO2 film deposition by atmospheric TPCVD

TiO2 film were deposited by atmospheric thermal plasma chemical vapor deposition (TPCVD) method to investigate the rapid process for functional film deposition. The experiment was conducted under the condition where working gas was Ar, working gas flow rate was 20 l/min, deposition distance was varied from 30 to 200 mm and spraying time was 10 min. Ethanol diluted titanium tetra buthoxide was used as starting material. Consequently, even in this process TiO2 films including anatase could be deposited, and the results of wettability and methylene blue decoloration testings suggest that the TiO2 films have good photo-catalytic property. Besides, by using extension nozzle, columnar structure film could be deposited due to a perfect starting material vaporization. From these results, the proposed process seemed to be highly promising for the rapid formation of functional thin films.