Molecular oxidation of surface -CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O3: A theoretical study

Molecular oxidation of surface -CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O3: A theoretical study

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 457, 1 November 2018, Pages 376-380

Seunggi Seo, Taewook Nam, Han-Bo-Ram Lee, Hyungjun Kim, Bonggeun Shong,