DC magnetron sputtered aligned ITO nano-rods with the influence of varying oxygen pressure

Aligned Nano rods of transparent conducting indium tin oxide (ITO) were deposited on glass substrates using dc magnetron sputtering technique from an ITO alloy target at two different oxygen pressures placing the substrates at three different lateral positions inside the chamber. The (4 4 0) oriented ITO thin films at optimal deposition conditions with high transmittance, low sheet resistance, good crystallinity and novel morphology was obtained at room temperature deposition. The structural, optical, morphological, electrical transport behavior and figure of merit imply the need in optimizing the positioning of the substrates within the chamber during deposition for achieving films of best desired properties.