کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
7836333 1503540 2018 17 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Anisotropic growth mechanism of tungsten diselenide domains using chemical vapor deposition method
ترجمه فارسی عنوان
مکانیسم رشد آنزایروبیک دامنه های تلسوتس دیزلنید با استفاده از روش رسوب بخشی شیمیایی
موضوعات مرتبط
مهندسی و علوم پایه شیمی شیمی تئوریک و عملی
چکیده انگلیسی
Anisotropic transition metal dichalcogenide (TMDC) domains have stimulated a growing interest mainly due to their electronic properties that depend on the size, shape, and edge structures of the domains. In this work, we investigated the anisotropic morphogenesis and edge terminations of tungsten diselenide (WSe2) domains grown on sapphire substrates by chemical vapor deposition (CVD) using tungsten oxide (WO3) and selenium (Se) powders as precursors. We varied the amount of Se powder and growth temperature during the CVD process, which in turn caused variations in the growth mechanism and kinetic energies of precursors. We succeeded in synthesizing hexagonal, square, circular, and triangular anisotropic WSe2 domains. They were characterized using scanning electron microscopy (SEM), Raman spectroscopy, photoluminescence (PL) analyses, and atomic force microscopy (AFM). Furthermore, we proposed the growth mechanism of anisotropic WSe2 domains with different edge terminations based on experimental observations through scanning tunneling microscope (STM).
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 432, Part B, 28 February 2018, Pages 170-175
نویسندگان
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