Al thin film: The effect of substrate type on Al film formation and morphology

It was determined that nucleation of the film deposited on the metallic substrate began when the film thickness exceeded 50 nm. Further increasing thickness triggered grain growth, and the formation of crystallites up to 40 nm occurred when film thickness was 150 nm. It was observed that grain growth was more favorable on metallic substrates, and the lowest grain growth was observed on the glass substrate.