کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
7209355 1469131 2012 12 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Roughness evolution of metallic implant surfaces under contact loading and nanometer-scale chemical etching
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی پزشکی
پیش نمایش صفحه اول مقاله
Roughness evolution of metallic implant surfaces under contact loading and nanometer-scale chemical etching
چکیده انگلیسی
Surface damage of metallic implant surface at taper lock and clamped interfaces may take place through synergistic interactions between repeated contact loading and corrosion. In the present research, we investigated the influence of surface roughness and contact loading on the mechanical and chemical damage phenomena. Cobalt-chromium (CoCrMo) specimens with two different roughness configurations created by milling and grinding process were subjected to normal and inclined contact loading. During repeated contact loading, amplitude of surface roughness reached a steady value after decreasing during the first few cycles. During the second phase, the alternating experiment of rough surface contact and micro-etching was conducted to characterize surface evolution behavior. As a result, surface roughness amplitude continuously evolved-decreasing during contact loading due to plastic deformation of contacting asperities and increasing on exposure to corrosive environment by the preferential corrosion attack on stressed area. Two different instabilities could be identified in the surface roughness evolution during etching of contact loaded surfaces: increase in the amplitude of dominant wavenumber and increase in amplitude of a small group of roughness modes. A damage mechanism that incorporates contact-induced residual stress development and stress-assisted dissolution is proposed to elucidate the measured instabilities in surface roughness evolution.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of the Mechanical Behavior of Biomedical Materials - Volume 14, October 2012, Pages 55-66
نویسندگان
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