| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10128737 | Materials Letters | 2018 | 4 Pages |
Abstract
The results of real-time in-situ spectroscopic investigation of copper films growth are presented. The films were deposited on fused silica substrates by magnetron sputtering. Three growing stages of copper films were in-situ, ex-situ analysed and compared with modelled values. The minimum continuous film thickness of about 10â¯nm was determined by such comparison. This new empirical method might be applied for multilayer coatings deposition.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Alexandr Belosludtsev, Naglis Kyžas,