Article ID Journal Published Year Pages File Type
10140114 Materials Science in Semiconductor Processing 2019 5 Pages PDF
Abstract
In this paper, the AlSb films were successfully prepared by direct-current (DC) magnetron sputtering technology and the deliquescence process and mechanism of AlSb films were investigated, moreover, the function of Cu membrane deposited on AlSb films was simply explored. It suggested that deliquescence processes of films were essentially local deliquescence and further formed some sand holes, ultimately, AlSb films fall off from the quartz glass substrate as increase in contact time between AlSb films and ambient air. Meanwhile, compared to bare AlSb films, Cu deposited on AlSb films could effectively prevent the appearance of sand holes in the specific conditions and the way of annealing treatment further improved the stability of AlSb films.
Related Topics
Physical Sciences and Engineering Engineering Electrical and Electronic Engineering
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