Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10265907 | Computers & Chemical Engineering | 2005 | 9 Pages |
Abstract
A means of identifying a subspace in the space of all deposition profile functions is developed, where the subspace spans all spatially nonuniform deposition profiles that result in uniform profiles under rotation in radial-flow chemical vapor deposition systems with planetary wafer rotation. This model-independent uniformity criterion is used to optimize film thickness uniformity in a representative CVD system; its applicability to other film deposition system design and optimization problems is discussed.
Keywords
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Physical Sciences and Engineering
Chemical Engineering
Chemical Engineering (General)
Authors
Raymond A. Adomaitis,