Article ID Journal Published Year Pages File Type
10275780 Journal of Electroanalytical Chemistry 2005 5 Pages PDF
Abstract
In this work, we give three examples of interfacial reactions in Al/transition metal (TM)- or Si/TM systems in which the specificities of the reactive diffusion (selectivity, nucleation threshold) on the nanoscale are emphasized. In particular, this allows the stabilisation of phases and interfaces, which are not expected from the equilibrium phase diagram, and a morphological development of the phases formed which can induce nanostructuring.
Related Topics
Physical Sciences and Engineering Chemical Engineering Chemical Engineering (General)
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