Article ID Journal Published Year Pages File Type
10283894 Composite Structures 2012 8 Pages PDF
Abstract
In this study, a plasma etching treatment was developed to decrease the contact resistance between a GDL and continuous-carbon/epoxy composite bipolar plate. The treatment removes the resin-rich layer of the composite surface, which is the source of the majority of the electrical resistance of the bipolar plate. The optimum plasma treatment condition was determined by calculating the resin etching depth, taking into consideration the carbon fiber dimensions of the GDL and the continuous-carbon/epoxy composite bipolar plate. Scanning Electron Microscopy (SEM) analysis was performed on the surface of the composite bipolar plate for each variation of plasma surface treatment. In addition, the tensile strength and the electrical resistance (in the through-thickness direction) of the composite bipolar plate were measured for the different plasma surface treatment conditions.
Related Topics
Physical Sciences and Engineering Engineering Civil and Structural Engineering
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