Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10393243 | Thermochimica Acta | 2005 | 9 Pages |
Abstract
To study the kinetics of processes on a millisecond time scale a thin-film nanocalorimeter based on a commercially available microchip (thermal conductivity vacuum gauge, TCG 3880, from Xensor Integration, NL) was constructed. The gauge consists of a submicron silicon nitride membrane with a film-thermopile and a film-heater, which are located at the 100 μm Ã 100 μm central part of the membrane. Controlled fast cooling is possible in addition to fast heating at essentially non-adiabatic conditions. To allow fast cooling the measurements are performed in an ambient gas atmosphere. It is proved that the maximum rate of the controlled cooling can be achieved with a gas cooling agent, rather than in a system with a solid heat-sink. The advantage of the gauge TCG 3880 is that its central heated region is small enough to be considered as a point source of the heat-flow into the gas, which essentially simplifies the calorimeter calibration. The maximum cooling rate is inversely proportional to the radius of the heated region. The gauge is placed in a thermostat with controlled gas pressure and temperature to be utilized as a device for fast scanning calorimetry of sub microgram samples with sensitivity 1 nJ/K and time resolution ca. 5 ms.
Keywords
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Fluid Flow and Transfer Processes
Authors
A.A. Minakov, S.A. Adamovsky, C. Schick,