Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10407047 | Materials Science in Semiconductor Processing | 2013 | 4 Pages |
Abstract
AlGaN/GaN/Si high electron mobility transistors (HEMTs) grown by molecular beam epitaxy are investigated using direct-current and radio-frequency measurements. As has been found, the maximum of drain current achieves 881 mA/mm with an extrinsic current gain cutoff frequency of 37 GHz for a 0.25 µm gate length. Pulsed characteristics also showed a reduction of trapping centers that improves the quality of the epilayers.
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Electrical and Electronic Engineering
Authors
Malek Gassoumi, Hana Mosbahi, Ali Soltani, Vanessa Sbrugnera-Avramovic, Mohamed Ali Zaidi, Christophe Gaquiere, Houcine Mejri, Hassen Maaref,