Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10409679 | Sensors and Actuators A: Physical | 2005 | 9 Pages |
Abstract
The high step in refractive index between silicon core and gas allows very small bending radii so that a sufficiently long waveguide can be realised on small chip area (about 1Â m on 1Â cm2). The waveguide is patterned as a spiral or a meander in the wafer plane. A suitable freestanding cross section profile is realized by a sequence of anisotropic dry etching, oxidation and isotropic dry etching of crystalline silicon bulk material.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Electrochemistry
Authors
Ralf Siebert, Jörg Müller,