Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10411182 | Solid-State Electronics | 2005 | 5 Pages |
Abstract
This paper presents a new analytical threshold voltage roll-off equation for MOSFET by effective-doping model. The short-channel MOSFET is viewed as distributed MOS capacitors with different effective-doping concentration in series. The 2D scale-length approach is adopted to find the potential distribution and the corresponding effective-doping concentration. The source and drain controlled charges are averaged over the channel depletion region to provide more realistic account of the effective-doping concentration. In addition, the lowering of the required band bending and the widening of the channel depletion are considered. As a result, the sub-exponential dependence of the threshold voltage roll-off on channel length is observed. The two governing factors, channel length and drain voltage, can be decoupled in the limit of a mild short-channel effect.
Related Topics
Physical Sciences and Engineering
Engineering
Electrical and Electronic Engineering
Authors
Chun-Hsing Shih, Yi-Min Chen, Chenhsin Lien,