| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10609157 | European Polymer Journal | 2011 | 20 Pages |
Abstract
⺠Conventional lithography techniques and resist materials are discussed. ⺠Methods include optical lithography, electron beam- and ion beam-lithography. ⺠Unconventional high-resolution patterning technologies are reviewed. ⺠Discussed unconventional methods include printing, molding and embossing. ⺠Strengths, limitations and prospects of patterning technologies are treated.
Related Topics
Physical Sciences and Engineering
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Authors
Canet Acikgoz, Mark A. Hempenius, Jurriaan Huskens, G. Julius Vancso,