Article ID Journal Published Year Pages File Type
10609624 European Polymer Journal 2012 9 Pages PDF
Abstract
► A perfluoropolyether based photocured polymer is characterized. ► It is highly reactive under irradiation, transparent, chemically and thermally resistant. ► It is a better material with respect to PDMS for microfluidic applications. ► Pattern transfer into the methacrylic fluoropolymer is possible by using a direct photolithographic approach.
Related Topics
Physical Sciences and Engineering Chemistry Organic Chemistry
Authors
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