Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10618980 | Synthetic Metals | 2005 | 4 Pages |
Abstract
We fabricated patterned polymer photonic crystals by holographic lithography in conjunction with soft lithography. A patterned SU-8 photoresist film was created by preformed pattern of a hard-baked SU-8 photoresist, transferred by a PDMS mold. Then, four-beam holographic exposure carved 3D photonic crystal structures onto the patterned photoresist. Because of refractive index matching of the photoresist and the hard-baked photoresist, scattering, which might have caused a distortion of interference pattern, did not occur. Eventually, an f.c.c. polymer structure with a line pattern was successfully created after development.
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Authors
Jun Hyuk Moon, Alex Small, Gi-Ra Yi, Seung-Kon Lee, Won-Seok Chang, David J. Pine, Seung-Man Yang,