Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10624153 | Ceramics International | 2016 | 5 Pages |
Abstract
We fabricated compounded ZrO2-Al2O3 nanolaminate dielectrics by the atomic layer deposition (ALD) and used them to successfully integrate the high-performance InZnO (IZO) thin-film transistors (TFTs). It is found that nanolaminate dielectrics combine the advantages of constituent dielectrics and produce TFTs with improved performance and stability compared to single-layer gate insulators. The mobility in IZO-TFT was enhanced about 22% by using ZrO2-Al2O3 gate insulators and the stability was also improved. The transfer characteristics of IZO-TFTs at different temperatures were also investigated and temperature stability enhancement was observed for the TFT with ZrO2-Al2O3 nanolaminates as gate insulators. A larger falling rate (â¼1.45Â eV/V), a lower activation energy (Ea, â¼1.38Â eV) and a smaller density-of-states (DOS) were obtained based on the temperature-dependent transfer curves. The results showed that temperature stability enhancement in InZnO thin-film transistors with ZrO2-Al2O3 nanolaminate as gate insulators was attributed to the smaller DOS.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
Jianhua Zhang, Xingwei Ding, Jun Li, Hao Zhang, Xueyin Jiang, Zhilin Zhang,