Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10624447 | Ceramics International | 2016 | 22 Pages |
Abstract
Thin films of amorphous alumina were fabricated using pulsed laser deposition. Topography, structural, and optical properties of alumina films were investigated depending on process parameters, specifically deposition time under vacuum and partial pressure of argon. Deposited films present good uniformity with RMS roughness ranging from 0.35 to 2.50Â nm. Alumina films with thickness lower than 40Â nm deposited under vacuum present a non-negligible void content that induces a decrease of the effective refractive index of the layers. Furthermore, introduction of argon gas (at 5Ã10â4 and 5Ã10â2Â mbar) during the deposition process induces grainy structure of the thin films documented by an increase of RMS roughness from 0.35 to 1.5Â nm. A decrease of the alumina layers' refractive index is observed in the 300-7500Â nm spectral range when increasing Ar pressure.
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Authors
Rémi Boidin, TomáÅ¡ HalenkoviÄ, Virginie Nazabal, LudvÃk BeneÅ¡, Petr NÄmec,