The effect of a constraint on the sintering and stress development in alumina thick films

The microstructural and stress evolution of thick (25 μm) alumina films on dense alumina substrates sintered at temperatures from 1300 °C to 1600 °C has been investigated. In this study the constraint on sintering was monitored in the absence of significant differences in thermal expansion between the film and the substrate. For comparison purposes unconstrained alumina pellets sintered at 1300 °C-1600 °C were also examined. Overall, the constrained alumina densified less than the free alumina, as expected, although at intermediate temperatures densification rates were comparable. Sintering in the direction perpendicular to the substrate was enhanced with respect to that parallel to the substrate as a means of stress relaxation. Using fluorescence spectroscopy the residual stresses of the films parallel to the substrates were measured; residual tensile stresses as high as 450±40 MPa were exhibited by the films. The considerable stress development resulted in cracking and delamination of the film from the substrate, subsequently film constraint was reduced and densification was not impeded.