| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10626549 | Ceramics International | 2005 | 8 Pages |
Abstract
The success in depositing perovskite PZT films using a Pb/PZT and PbO/PZT dual-target sputtering system presents the possibility of processing windows of substrate temperature between 500 °C and 580 °C. Structural change as a function of deposition conditions and lead sources correlated with ferroelectric characteristics.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
W.L. Chang, J.L. He,