Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10633708 | Optical Materials | 2005 | 5 Pages |
Abstract
By reactive evaporation of pure silicon in a molecular oxygen atmosphere, thin films of amorphous SiOx can be obtained with 0.7 ⩽ x ⩽ 1.85. The composition and the structure of the films were investigated by energy dispersive X-ray spectroscopy, infrared absorption spectroscopy, X-ray photoelectron spectroscopy and Raman spectroscopy. By a judicious choice of the oxygen pressure, the as-deposited films exhibit visible room-temperature photoluminescence with a peak centered at about 650 nm. At the liquid-nitrogen temperature, some samples also present an electroluminescence peak centered at 740 nm.
Related Topics
Physical Sciences and Engineering
Materials Science
Ceramics and Composites
Authors
O. Jambois, M. Molinari, H. Rinnert, M. Vergnat,