Bulk instability of nickel disilicide at reduced temperatures

Bulk alloy annealing experiments indicate that a NiSi + Si ↔ NiSi2 eutectoid reaction exists in the Ni-Si binary system between 705 and 735 °C. The eutectoid temperature is consistent with temperatures often observed for the nickel monosilicide-to-disilicide transformation in nickel silicide thin films on crystalline silicon substrates.