Article ID Journal Published Year Pages File Type
10638096 Materials Chemistry and Physics 2011 6 Pages PDF
Abstract
▶ Nickel is reactively sputtered in the presence of oxygen by dc magnetron sputtering. ▶ The substrate bias voltage was highly influenced the physical properties of NiO films. ▶ The films were preferentially grown along (200) orientation at all bias voltages. ▶ The NiO films with good microstructure have grown at bias voltage of −75 V. ▶ The films grown at −75 V have high transparency and low electrical resistivity.
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Related Topics
Physical Sciences and Engineering Materials Science Electronic, Optical and Magnetic Materials
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Effect of substrate bias voltage on the physical properties of dc reactive magnetron sputtered NiO thin films
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