Article ID Journal Published Year Pages File Type
10640014 Materials Science and Engineering: B 2005 6 Pages PDF
Abstract
Chromium thin films are technologically important as underlayers for the deposition of cobalt-based magnetic films because of their good lattice match and adhesion. The structural orientation and morphology of the chromium under layers control the magnetic properties of the cobalt-based films deposited on them. Hence, optimization of the structure and properties of chromium under layers is essential for realizing magnetic thin films with desired properties. In this paper, we report the structural variation observed in chromium thin films deposited on silicon(1 0 0) substrates deposited using Ion Beam Sputter Deposition (IBSD) technique. The influence of process parameters, such as ion beam current density, substrate temperature and the angle of incidence of the condensing species, on the structural transformation from (1 1 0) orientation to (2 0 0) orientation has been presented. The structural variation and morphological variations observed have been discussed based on the growth models and the energetics involved in the process.
Related Topics
Physical Sciences and Engineering Materials Science Electronic, Optical and Magnetic Materials
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