| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10641381 | Photonics and Nanostructures - Fundamentals and Applications | 2014 | 7 Pages |
Abstract
- Employing PS spheres with a diameter of 600Â nm as an etching mask.
- PS spheres were uniformly spun onto a 2Â in. Si substrate.
- Two-step etching method to enhance the height of structures.
- Significantly reduced reflectance across the entire spectral range.
Related Topics
Physical Sciences and Engineering
Materials Science
Electronic, Optical and Magnetic Materials
Authors
Yeeu-Chang Lee, Che-Chun Chang, Yen-Yu Chou,