| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668159 | Surface and Coatings Technology | 2011 | 8 Pages |
Abstract
⺠TiSiN coating was deposited using a combination of direct current (DC) and radio frequency (RF) PVD magnetron sputtering. ⺠The deposition processes were conducted by utilizing an L9 Taguchi orthogonal array. ⺠Variable input parameters were optimized for achieving high scratch adhesion strength of the TiSiN coatings. ⺠Optimization resulted in an increase of the critical load from 827 mN to 1371 mN, signifying an improvement of over 65%.
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Authors
A.R. Bushroa, H.H. Masjuki, M.R. Muhamad, B.D. Beake,