| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668223 | Surface and Coatings Technology | 2012 | 5 Pages |
Abstract
⺠Model of sputtering yield amplification with rotating magnetrons was developed. ⺠The influence of W and Bi doping was analyzed. ⺠Deposition rate increase of up to 100% was predicted for reactive deposition of Al2O3. ⺠Results are in good agreement with experiments.
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Authors
T. Kubart, R.M. Schmidt, M. Austgen, T. Nyberg, A. Pflug, M. Siemers, M. Wuttig, S. Berg,