| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668240 | Surface and Coatings Technology | 2012 | 7 Pages |
Abstract
⺠We model the coverage of a non-woven substrate by thermal and plasma enhanced atomic layer deposition. ⺠The results are compared to experiments. ⺠The conformality of thermal ALD is limited by diffusion. ⺠The conformality of plasma enhanced ALD is limited by radical recombination.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
J. Musschoot, J. Dendooven, D. Deduytsche, J. Haemers, G. Buyle, C. Detavernier,