| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668249 | Surface and Coatings Technology | 2012 | 5 Pages |
Abstract
⺠An ionized plasma is generated by means of a hollow cathode discharge. ⺠Discharge can be sustained in DC mode, or in high-power pulsed (HiPP) mode. ⺠Amorphous, copper containing carbon coatings have been deposited at up to 30 μm/h. ⺠More efficient PECVD process by using HiPP + DC power, compared to DC power
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Henrik Pedersen, Petter Larsson, Asim Aijaz, Jens Jensen, Daniel Lundin,