| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668271 | Surface and Coatings Technology | 2012 | 6 Pages |
Abstract
âºMagnetron sputtering of CrN hard coatings with pulsed bias âºAsymmetric bipolar pulsed bias with different electron-to-ion flux ratios âºElectron bombardment increases adatom mobility and annealing without re-sputtering. âºElectron-to-ion flux ratio changes microstructure and mechanical properties. âºVariation of ion-to-atom flux ratio shifts turn-over in texture of CrN phase.
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Physical Sciences and Engineering
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Nanotechnology
Authors
S. Grasser, R. Daniel, C. Mitterer,