| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668327 | Surface and Coatings Technology | 2012 | 9 Pages |
Abstract
⺠Nanocrystalline Cr2O3 thin films were prepared by arc ion plating technique. ⺠Influence of substrate bias voltage on film growth process, microstructure, and characteristics was studied. ⺠Grain size and lattice constant of AIP Cr2O3 films were slightly changed by applying different bias voltages. ⺠Microstructure and surface morphology of AIP Cr2O3 films were greatly altered by substrate bias voltage and ion current density.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Tie-Gang Wang, Dawoon Jeong, Soo-Hyun Kim, Qimin Wang, Dong-Woo Shin, Solveig Melin, Srinivasan Iyengar, Kwang Ho Kim,