| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668331 | Surface and Coatings Technology | 2012 | 6 Pages |
Abstract
⺠Ti2AlN phase can be formed after annealing Ti-Al-N films at 700 °C via solid state reaction. ⺠The critical value of nitrogen concentration for the phase formation is in the range of 22.5-29.6 at.%. ⺠The fractographs change from columnar to equiaxed crystals after the formation of Ti2AlN phase. ⺠The microhardness of the films composed of Ti2AlN phase shows a good value of 18-24 GPa.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Ying Yang, Martin Keunecke, Christian Stein, Li-Jun Gao, Jun Gong, Xin Jiang, Klaus Bewilogua, Chao Sun,