| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668333 | Surface and Coatings Technology | 2012 | 6 Pages |
Abstract
⺠Ab initio calculations enable for the prediction of as-deposited structures in Ti1 â x â yAlxHfyN. ⺠Additions of 5 mol% HfN in Ti1 â x â yAlxHfyN raise the formation temperature of w-AlN by ~ 200 °C. ⺠10 at.% Hf at the metallic sublattice of Ti1 â x â yAlxHfyN protect from full oxidation at 950 °C for 20 h.
Related Topics
Physical Sciences and Engineering
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Authors
R. Rachbauer, A. Blutmager, D. Holec, P.H. Mayrhofer,