| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668365 | Surface and Coatings Technology | 2011 | 4 Pages |
Abstract
⺠Deposition of Ni-P films at high film growth rate using nickel chloride as source. ⺠Effect of temperature, bath pH, and reducing agent concentration were examined. ⺠Heat treatment to obtain homogeneous, crystalline and hard coatings. ⺠Acid etching to produce spectrally selective surfaces with high absorption. ⺠SEM, AFM, XRD were used for structural and compositional characterization of films.
Keywords
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Mohammad Islam, Tauheed Shehbaz,