| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668386 | Surface and Coatings Technology | 2011 | 4 Pages |
Abstract
⺠The nanoscale friction behavior of partially oxidized Si3N4 thin films is studied. ⺠A modification of the crystal chemistry model for tribology is suggested. ⺠Ultra-low friction coefficients for SiOxNy are observed.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
J. Filla, C. Aguzzoli, V. Sonda, M.C.M. Farias, G.V. Soares, I.J.R. Baumvol, C.A. Figueroa,