| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668393 | Surface and Coatings Technology | 2011 | 5 Pages |
Abstract
âºThe a-C:H films deposited by magnetron sputtering with CH4 have low internal stress (<1 GPa). âºThe CH4/Ar ratio plays an important role in the H content but acts a little function on the sp3/sp2 âºThe fraction of sp3 C alone is not a reliable estimate of the film structure or properties. âºThe film with dense structure and moderate sp3 C-C/sp3 C-H has the best tribological properties.
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Authors
Yongxia Wang, Yinping Ye, Hongxuan Li, Li Ji, Yongjun Wang, Xiaohong Liu, Jianmin Chen, Huidi Zhou,