| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668394 | Surface and Coatings Technology | 2011 | 14 Pages |
Abstract
⺠AVA deposition rate is much higher than that of sputter deposition. ⺠AVA-deposited Cu films possess smaller crystallites than dc-sputtered ones. ⺠AVA deposited films having thickness less than 100 nm are more resistive. ⺠AVA deposited Cu films show lower temperature coefficient of resistance. ⺠The change in thermoelectric power w.r.t. Cu bulk is higher in AVA deposited films.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
S.K. Mukherjee, L. Joshi, P.K. Barhai,