| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668430 | Surface and Coatings Technology | 2011 | 4 Pages |
Abstract
âºWe demonstrate the deposition of α-WC/a-C coatings using an HFCVD reactor. âºWith this method the α-WC thickness and the a-C content are easily controllable. âºTungsten evaporation time is the main parameter influencing the film thickness. âºThe a-C content in the coatings is mainly controlled by the CH4/H2 flow ratio.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
M.A. Neto, E.L. Silva, A.J.S. Fernandes, F.J. Oliveira, R.F. Silva,