Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10668453 | Surface and Coatings Technology | 2011 | 6 Pages |
Abstract
Plasma polymer nanostructures were prepared by cluster beam deposition. The nanocluster source assembled in our laboratory is implementing a 2Â in. planar magnetron operated in radio-frequency mode and follows the Haberland concept. Clusters were deposited on glass or silicon substrates without mass separation in order to get high deposition rates. C:H plasma polymer clusters with a typical size of about 100Â nm (measured by AFM) were prepared by RF discharge in argon/hexane atmosphere. The influence of deposition conditions was studied with respect to size distribution (AFM and SEM), chemical and physical properties (XPS and FTIR) of resultant clusters.
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Authors
P. SolaÅ, O. Polonskyi, A. Choukourov, A. Artemenko, J. HanuÅ¡, H. Biederman, D. SlavÃnská,