| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668464 | Surface and Coatings Technology | 2011 | 5 Pages |
Abstract
Wear resistant, atomically smooth a-C:H films with a hardness above 25 GPa were deposited at a very high rate of 15 μm/h. The combination of high rate and high hardness values should be promising for industrial applications, even for in-line technologies. For the both mentioned precursors C2H2 and C4H8 some differences in hardness-rate relations were observed.
Related Topics
Physical Sciences and Engineering
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Nanotechnology
Authors
M. Günther, I. Bialuch, S. Peter, K. Bewilogua, F. Richter,