| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668477 | Surface and Coatings Technology | 2011 | 6 Pages |
Abstract
⺠We suggest an alternative method for Cr deposition with high corrosion. ⺠PIII, glow discharge plasma and magnetron sputtering were used to deposit Cr films. ⺠Cr films showed higher corrosion resistance due to lower corrosion current density. ⺠Hydrophobic character of Cr films turned samples less susceptible to corrosion. ⺠Film and mixing layer thicknesses increased with the increase of GD power.
Keywords
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
C.B. Mello, M. Ueda, R.M. Oliveira, J.A. Garcia,