| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668482 | Surface and Coatings Technology | 2011 | 4 Pages |
Abstract
⺠Simulation of the time evolution of plasma deposited μc-Si:H films structure and morphology. ⺠Edge effects on film thickness and structure uniformity. ⺠Calculation of time evolution of species and ions fluxes towards the surface. ⺠Calculations of stable silicon nuclei size on the glass - Si film - vacuum system. ⺠Mechanism of crystallization and frequencies of surface and gas-surface processes.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
E. Amanatides, D. Mataras,