Article ID Journal Published Year Pages File Type
10668526 Surface and Coatings Technology 2011 4 Pages PDF
Abstract
► Sputter target oxidation level in reactive (R) HIPIMS affects the process behaviour. ► Enhanced sputter target oxidation during R HIPIMS plays the major role. ► Hysteresis and process window are reduced if starting target surface is not clean.
Keywords
Related Topics
Physical Sciences and Engineering Materials Science Nanotechnology
Preview
The effect of Ti sputter target oxidation level on reactive High Power Impulse Magnetron Sputtering process behaviour
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