| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668551 | Surface and Coatings Technology | 2011 | 5 Pages |
Abstract
A short overview on the method of applying (passive) calorimetric probes is given. Calorimetric probes have been used for the characterization of a large variety of process plasmas ranging from arc discharges, different types of magnetrons, rf-discharges for plasma polymerisation and etching purposes, ion beam sources and atmospheric pressure discharges. The aim of this work is to show the versatility of the calorimetric method for the characterization of metal cluster sources. In a second part we show the current status of the calorimetric method and first measurements for the characterization of such a plasma source which is used for deposition of silver nanoclusters which will be embedded into a polymer matrix to form nanostructured materials with special optical and electrical properties.
Related Topics
Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
S. Bornholdt, T. Peter, T. Strunskus, V. Zaporojtchenko, F. Faupel, H. Kersten,