Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
10668552 | Surface and Coatings Technology | 2011 | 4 Pages |
Abstract
Hollow cathode arc discharges are efficient plasma sources and are applied in substrate pretreatment or plasma-activated deposition processes. In order to generate large volume homogeneous plasmas to guarantee uniformity of plasma activation and coating properties, in the presented configuration a ring-shaped anode is positioned coaxially around the hollow cathode tube. A magnetic field is applied, which is axial within the cathode tube and spreads out in the deposition chamber. In order to characterize the hollow cathode plasma, spatially resolved Langmuir probe measurements have been carried out. The charge carrier density maximum on the cathode tube axis reaches values up to 1013 cmâ 3. With increasing distance from the plasma source, the plasma density decreases and shows a smoother lateral profile. Maxwellian electron energy distribution functions are observed with spatially homogeneous electron temperatures in the range 1-4 eV. Increasing the chamber pressure leads to higher plasma densities and lower electron temperatures. Reduction of the gas flow through the hollow cathode tube results in a strong rise of the plasma density over two orders of magnitude. The magnetic field supports the low gas flow mode and leads to higher plasma densities, too. The results of the Langmuir probe measurements are discussed by means of the active zone model and are further related to optical emission measurements performed in the vicinity of the hollow cathode orifice.
Keywords
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Physical Sciences and Engineering
Materials Science
Nanotechnology
Authors
Burkhard Zimmermann, Fred Fietzke, Wolfhard Möller,