Article ID Journal Published Year Pages File Type
10668587 Surface and Coatings Technology 2010 5 Pages PDF
Abstract
Alumina films were synthesized on Si(100) substrates at different temperatures in the range of 600 to 900 °C using open atmosphere combustion chemical vapour deposition (C-CVD) technique. A custom made premixed-diffusion type burner with an extra coaxial oxygen inlet close to the burner mouth enabled variation of deposition temperature from 600 to 900 °C in steps of 100 (± 10) °C. The presence of γ- and θ-alumina phases were observed in films synthesized in the temperature range of 600-800 °C, whereas at 900 °C single phase θ-alumina films were obtained. Adherent coatings were obtained at temperatures ≥ 700 °C. The grain size and roughness of the films increased with deposition temperature. The films underwent two types of adhesion failures, a continuous ductile perforation and a tensile type hertzian crack due to the presence of interfacial oxide layer, during scratch test. The presence of SiO2 interfacial layer between substrate and film was discerned from ellipsometric studies.
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Physical Sciences and Engineering Materials Science Nanotechnology
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