| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 10668945 | Surface and Coatings Technology | 2005 | 8 Pages |
Abstract
The structural modification of pure DLC films was attempted by the addition of Siî¸O structures into the DLC films. The chemical structures of SiOx/DLC films were investigated by FT-IR, XPS and Raman spectrometer and the microstructure by TEM. The SiOx/DLC films composing of two amorphous materials showed that amorphous silica were independently interconnected with amorphous hydrocarbon. The mechanical properties of SiOx/DLC films deposited at different bias voltages were discussed in terms of Raman parameters. The friction coefficient of SiOx/DLC films was obtained under the different applied loads and environmental conditions. The frictional behavior of SiOx/DLC films deposited at different bias voltages was investigated.
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Authors
Won Jae Yang, Tohru Sekino, Kwang Bo Shim, Koichi Niihara, Keun Ho Auh,